Ion Beam Sputtering (IBS)

Ion Beam Sputtering (IBS) is a premier deposition technology for optical coatings. IBS films exhibit extremely low absorption and scatter when compared with films deposited by other means. The high energy of the condensing material produces bulk-like, amorphous layers with minimal micro-structure and negligible vacuum-to-air shift. As a highly deterministic and consistent process, IBS is capable of accurately and routinely depositing complicated, multifunctional film structures. The low operating temperature of the IBS process is compatible with temperature-sensitive substrates, such as gratings, electro-optical mechanical components, and deformable mirrors.

For more information on the Ion Beam Sputtering process consult the original patents, co-authored by MLD founding partner Tony Louderback.

Patent 4,142,958
Method for fabricating multi-layer optical films
Filed: Apr 13, 1978
Issued: Mar 06, 1979
Litton Systems, Inc.
David T. Wei, Anthony W. Louderback

RE 32849
Method for fabricating multi-layer optical films
Filed: July 2, 1985
Issued: January 31, 1989
Litton Systems, Inc.
David T. Wei, Anthony W. Louderback